J1

Non-Dissociative Laser Induced Desorption of Molecules from Dielectric Surfaces.
S J Clemett a , A W Parker b , K V Puttkamer a , A Takami a & C J S M Simpson a
a Physical Chernistry Laboratory, Oxford University, South Parks Road, Oxford, UK
b Rutherford Appleton Laboratory, Chilton, UK
Journal of Electron Spectroscopy & Related Phenomena , 5 4/55 , (1990), 211-220

J2

ESDIAD Studies of Chlorine Adsorption at Silicon (100)
S L Bennett, C L Greenwood* & E M Williams
Interdisciplinary Research Centre in Surface Science & Department of Electrical Engineering & Electronics, University of Liverpool, PO Box 147; Liverpool, L69 3BX, UK
* Case student in association with Hiden Analytical, Warrington, UK
Presented at the 5th International Workshop on Desorption Induced by Electronic Transitions
(DIET V), Taos, New Mexico, USA

J3

A New Type of Instrumentation Designed for the Study of Chemical Reactions on Single Crystal Surfaces.
Taro Yamada, Takashi Misono, Ken-ichi Tanaka &Yoshitada Murata
The Institute for Solid State Physics, University of Tokyo, 7-22-1 Roppongi, Minato-Ku, Tokyo 106, Japan
J. Vac. Sci. Technol . A 7 ( 4 ), Jul/Aug 1989.

J4

Electron and Photon Stimulated Desorption of Negative Ions from Oriented Physisorbed Molecules.
R J Guest l , R A Bennett l , L A Silva l , R G Sharpe 1 , J C Barnard 1 , R E Palmer 1 & M A MacDonald 2
1 Cavendish Laboratory, University of Cambridge, Madingley Road, Cambridge, CB3 OHE, UK.
2 SERC Daresbury Laboratory, Warrington, Cheshire, WA4 4AD, UK
DIET V Proceedings

J5

Electron Stimulated Desorption of Negative Ions From Oriented Physisorbed Molecules.
R J Guest, L A Silva & R E Palmer
Cavendish Laboratory, University of Cambridge, Madingley Road, Cambridge, CB3 OHE
Submitted to Physical Review Letters (Received 9th March 1992)

J6

Resonance Electron Scattering by Physisorbed and Chemisorbed O 2 on Pt(111). Bond Lengths with a Ruler Revisited?
L Siller (1 2), J F Wendelken (2), K M Hock (1) & R E Palmer (1)
1Cavendish Laboratory, University of Cambridge, Madingley Road, Cambridge, CB3 OHE, UK
2Solid State Division, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831, USA
Submitted to Phys. Rev. Lett , July 1992

J7

Resonance Electron Scattering by Adsorbed Molecules: rT* Resonance Energy Versus Bond Length.
L Siller, K M Hock & R E Palmer
Cavendish Laboratory, University of Cambridge, Madingley Road, Cambridge CB3 OHE, UK
and J F Wendelken
Solid State Division, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831, USA
IVC-12 ICSS-8 . Abstratct Number 788 . Session Topic "Photoinduced surface processe"

J8

Resonant Substrate-Mediated Photodissociation of Adsorbed Molecules: O 2 /Graphite.
R A Bennett, R G Sharpe, R J Guest, J C Barnard, R E Palmer
Cavendish Laboratory, University of Cambridge, Madingley Road, Cambridge CB3 OHE, UK
and M.A. MacDonald,
SERC Daresbury Laboratory, Daresbury, Warrington, Cheshire, WA4 4AD, UK
Chemical Physics Letters , Volume 198 , number 1,2 - 2nd October, 1992

J9

Evidence of Multiple H + Ion Desorption Pathways with ESD of Chemisorbed and Multilayer Water.
B.H. Sakakini*, Y.H. Taufiq-Yap+, & K.C. Waugh*
*Department of Chemistry, UMIST, P.O. Box 88, Manchester, M60 1 QD, UK
+Department of Chemistry, Universiti Putra Malaysia, 43400 UPM Serdang, Malaysia
Received September 23, 1998; revised February 1999; accepted March 29, 1999

J10

An ESD and ESDIAD Investigation of TiO 2 (110}-SO 2 .
C L Greenwood a , E M Williams a , G Thornton b , S L Bennett c , E Roman d , J L de Segovia d , M C Torquemada d
IRC in Surface Science, University of Liverpool L69 3BX, UK
a Dept of Electrical Engineering & Electronics, Surface Research Centre, The University of Liverpool, PO Box 147, Liverpool, L69 3BX, UK
b Also at: Department of Chemistry, Manchester University, Manchester M13 9PL, UK
c Present address: Cavendish Laboratory, University of Cambridge, Madingley Road, Cambridge, CB3 OHE, UK
d Laboratorio de Fisica de Superficies, Instituto de Ciencia de Materiales, CSIC, Serrano 144, E-28006 Madrid, Spain
Surface Science 287/288 (1993), 386-390

J11

ESDIAD Studies of Fluorine and Chlorine Adsorption at Si(100).
S L Bennett 1 , C L Greenwood & E M Williams
Department of Electrical Engineering & Electronics & IRC in Surface Science, University of Liverpool, P.O. Box 147, Liverpool L69 3BX, UK
1 Present address: Cavendish Laboratory, University of Cambridge, Madingley Road, Cambridge, CB3 OHE, UK
Surface Science 290 (1993) 267-276

J12

Electron Stimulated Desorption of O + from TiO 2 (110)-SO 2 .
M C Torquemada 1 , J L de Segovia 1 , E Roman l , G Thornton 2 E M Williams 2 & S L Bennett 2
1 Laboratorio de Fisica de Superficies, Instituto de Ciencia de Materiales, CSIC, Serrano 144, E-28006 Madrid, Spain
2 Interdisciplinary Research Centre in Surface Science, University of Liverpool, Liverpool, L69 3BX, UK
Springer Series in Surface Sciences, Vol 31

J13

The Cl/Si (100) Interface observed by ESDIAD & Related Techniques.
Q Guo, D Sterratt & E M Williams
IRC in Surface Science, The University of Liverpool, P.O. Box 147, Liverpool, L69 3BX, UK

J14

In situ SIMS monitoring for Ion Beam Etching of III-V semiconductor compounds & metal contacts.
H J Hensel, A Paraskevopoulos, L Morl, F Reier, A Hase* & J Bottcher
Heinrich-Hertz-Institut fur Nachrichtentechmk GmbH, Einsteinufer 37, 1000 Berlin 10, Germany
*On leave from the Univ. of Stuttgart, 4 Phys. Institut
Presented at The 5th International Conference on Indium Phosphide & Related Materials ,
Maison de la Chimie, Paris, France, 19-22 April, 1993

J15

Thermal Stability of ESD of O + Ions Ejected from TiO(110).
M C Torquemada & J L de Segovia
Dept. de Fisica e Ingenieria de Superficies, Instituto de Ciencia de Materiales, CSIC, Serrano 144, E-28006 Madrid, Spain
Vacuum , volume 46 , numbers 8-10, 1219-1222, 1995

J16

Electron Stimulated Desorption from CaF 2 : Penetration Depth of Electrons & Sample Charging .
R Bennewitz a , D Smith a , M Reichling a , N Itoh b , R M Wilson c
a Fachbereich Physik, Freie Universitat Berlin, Arnimallee 14, 14195 Berlin, Germany
b Dept. of Physics, Nagoya University, Furo-Cho, Chikusa, Nagoya 464-01, Japan
c Dept. of Physics, Wake Forest University, Winston-Salam, NC 27109, USA
Nuclear Instruments & Methods in Physics Research B 101 (1995), 118-121

J17

End Point Detection in Ion Beam Milling of YBa 2 Cu 3 0 7 Thin Films .
R G Humphreys, N G Chew, S F Morgan, J S Satchell, A G Cullis & P W Smith
DRA Electronics Division (RSRE), Malvern, Worcs, WR14 3PS, UK
Applied Physics Lett . 61 (2) 13 July 1992, 228-230

J18

Process Control for III-V Semiconductor Device Fabrication using Mass Spectroscopy.
A P Webb
GEC Marconi Materials Technology Group, Caswell, NN12 8EQ, UK
Applied Surface Science 63 (1993), 70-74

J19

Applications of in situ SIMS During Processing of Electronic Materials.
A P Webb* and J A Smith+
*Plessey Research & Technology, Allen Clark Research Centre, Caswell, Towcester, Northants, NN12 8EQ, UK
+Hiden Analytical, 420 Europa Boulevard, Warrington, WA5 5UN, UK
Surface & Interface Analysis , Vol. 12 , 303-308 (1988)

J20

Secondary ion emission from silicon under 8 keV O 2 and Ar + ion bombardment.
C H A Huan, A T S Wee, H S M Low & K L Tan
Department of Physics, National University of Singapore, Lower Kent Ridge Road, Singapore 0511, Republic of Singapore
Vacuum , volume 4 , number 2, 119-127 (1996)

J21

Electron stimulated desorption from selected phases of physisorbed CO/graphite: evidence for structure sensitive desorption dynamics.
P Laitenberger* & R E Palmer#
*Nanoscale Physics Research Laboratory, School of Physics & Space Research, University of Birmingham, Edgbaston, Birmingham, BN15 2TT, UK
# Cavendish Laboratory, University of Cambridge, Madingley Road, Cambridge, CB3 OHE, UK
J. Phys.: Condens. Matter 8 (1996) L71-L78

J22

Evaluation of inelastic energy losses for low-energy Ne + ions scattered from aluminium & silicon surfaces.
A Tolstogouzov, S Daolio, C Pagura
Istituto di Polarografia ed Elettrochimica Preparativa (IPELP-CNR), Corso Stati Uniti 4, I-35127 Padova, Italy
Surface Science 441 (1999) 213-222

J23

Neutralization of low-energy Ne + ions scattered from metal surfaces: study of mass-resolved ion scattering spectrometry.
A Tolstogouzov, S Daolio, C Pagura, C L Greenwood*
Istituto di Polarografia ed Elettrochimica Preparativa (IPELP-CNR), Corso Stati Uniti 4, I-35127 Padova, Italy
*Hiden Analytical, 420 Europa Boulevard, Warrington, WA5 5UN, UK
Surface Science 466 (2000) 127-136

J24

Round robin characterisation of the thickness and composition of thin to ultra-thin AINO films.
Alexander B Tolstogouzov, S Daolio, C Pagura, S Barison
Ion Beam Group, IPELP CNR, Corso Stati Uniti 4, I-35127 Padova, Italy
Padua, 14/12/2000

J25

Photo stimulated ion desorption from polyatomic molecules in the VUV: C 2 H 4 -graphite.
J M Coquel*, T Almeida Gasche*#, J Wilkes*A, C M Friedrich~, C L A Lamont^, M A MacDonald+, R E Palmer* & A M C Moutinho**
*Nanoscale Physics Research Laboratory, School of Physics & Space Research, University of Birmingham, Birmingham, B15 2TT, UK
#Deptamento de Quimica, Instituto Tecnologico e Nuclear, Estrada Nacional 10, 2686 Sacavem Codex, Portugal
^School of Applied Sciences, University of Huddersfield, Huddersfield, HD1 3DU, UK
~Cavendish Laboratory, University of Cambridge. Madingley Road, Cambridge, CB3 OHE, UK
+CLRC, Daresbury Laboratory, Warrington, WA4 4AD, UK
**GIDS, Departamento de Fisica, Faculdade de Cienians e Tecnologia, Universidade Nova de Lisboa, 2825 Monte da Caparica, Portugal
J. Phys.: Condens. Matter 8 (1996) L153-L158

J26

Photodissociation of condensed carbon dioxide below the gas phase thresholds.
J M Coquel a , L Siller a , J Wilkesa b , R Carapaa d , C L A Lamont b , T Almeid a Gasch c , R E Palmer a , M C Moutinho d
a Nanoscale Physics Research Laboratory, School of Physics & Space Research, University of Birmingham, Birmingham, B15 2TT, UK
b School of Applied Sciences, University of Huddersfield, Huddersfield, HD1 3DU, UK
c Deptamento de Quimica, Instituto Tecnologico e Nuclear, Estrada Nacional 10, 2686 Sacavem Codex, Portugal
d GIDS, Departamento de Fisica, Faculdade de Cienians e Tecnologia, Universidade Nova de Lisboa, 2825 Monte da Caparica, Portugal
Chemical Physics Letters 287 (1998) 742-746

J27

Adsorption & decomposition of ethylene (C 2 H 4 ) on GaAs(100).
Y Chen, J C Barnard, L Siller, J Schmidt, R E PaLmer
Nanoscale Physics Research Laboratory, School of Physics & Astronomy, University of Birmingham, Birmingham, B15 2TT, UK
Surface Science 441 (1999) 192-198

J28

Hyperthermal and low-energy Ne + scattering from Au and Pt surfaces.
A Tolstogouzov*, S Daolio, C Pagura
Istituto di Polarografia ed Elettrochimica Preparativa (IPELP-CNR), Corso Stati Uniti 4, I-35127 Padova, Italy
*Ryazan State Radio Engineering Academy, Gagarina str. 59/1. 391000 Ryazan, Russia
NIMB, Nuclear Instruments & Methods in Physics Research B 184 (2001) 116-127

J29

Energy distributions of secondary ions sputtered from aluminium and magnesium by Ne + , Ar + and O 2 + : a comprehensive study
A. Tolstogouzov a *, S. Daolio a , C. Pagura a , C.L. Greenwood b
a Istituto di Polarografia ed Elettrochimica Preparativa (IPELP-CNR), Corso Stati Uniti 4, 35127 Padova, Italy
b Hiden Analytical Ltd., 420 Europa Boulevard, Warrington WA5 7UN, UK
International Journal of Mass Spectrometry 214 (2002) 327–337

J30

A SIMS study on positive and negative ions sputtered from graphite by mass-separated low energy Ne + , N 2 + and N + ions
Z.W. Deng*, R. Souda
Advanced Materials Laboratoy, National Institute for Materials Science (AML/NIMS), 1-1 Namiki, Tsukuba, Ibaraki 305, Japan
NIMB, Nuclear Instruments & Methods in Physics Research B 183 (2001) 260-270

J31

Gas-cluster ion beams for SIMS analysis of thin films
D B Fenner & Y Shao
Epion Corp of JDS Uniphase Corporation, Billerica, Massachusetts 01821, USA

J32

Surface analysis by secondary-ion mass spectroscopy during etching with gas-cluster ion beams
D B Fenner & Y Shao
Epion Corp of JDS Uniphase Corporation, Billerica, Massachusetts 01821, USA
J. Vac. Sci. Technol. A 21(1), (Jan/Feb 2003) 47–58