RADICALS ANALYSIS

D1

Electron attachment mass spectrometry for the detection of electronegative species in a plasma
Winfred William Stoffels*, Eva Stoffels & Kunihide Tachibana
Department of Electronic Science & Engineering, Kyoto University, Yoshida-Honmachi,
Sakyo-ku, Kyoto 606-01, Japan
*On leave from Department of Physics, Eindhoven University of Technology, PO Box 513,
NL-5600 MB Eindhoven, The Netherlands
Jpn. J. Appl. Phys. Vol. 36 (1997), 4638-4643

D2

Kinetics of F atoms and fluorocarbon radicals studies by threshold ionization mass spectrometry in a microwave CF 4 plasma
A Tserepi, W Schwarzenbach, J Derouard & N Sadeghi
Laboratoire de Spectrométrie Physique, UMR CNRS 5588, Université Joseph Fourier-Grenoble
1 BP 87, F-38402 Saint Martin d'Hères Cedex, France
J. Vac. Sci. Technol. A 16 ( 6), Nov/Dec 1997, 3120-3126

D3

Comparative study of silane radical composition in continuous and pulsed electron cyclotron resonance discharges
Yasuyoshi Yasaka & Kou Hishimura
Department of Electronic Science & Engineering, Kyoto University, Yoshida-honmachi,
Sakyo-ku, Kyoto 606-8501, Japan

D4

Mass spectrometric detection of F atoms and CF x radicals in CF 4 plasmas
Walter Schwarzenbach, Angeleki Tserepi, Jacques Derouard & Nader Sadegii
Laboratoire de Spectrométrie Physique, (CNRS: UMR 5588), Université Joseph Fourier-Grenoble I, BP 76, F-38402 St Martin d'Hères, France
Jpn. J. Appl. Phys. Vol 36 (1997), 4644-4647

D5

Volume/surface effects on electron energy and dissociation reactions in large-volume plasma reactors
Keizo Kinoshita, Shuichi Noda, Satoshi Morishita, Naoshi Itabashi, Mitsuru Okigawa, Makoto Sekine & Masasmi Inoue
Plasma Technology Lab., Association of Super-advanced Electronics Technologies (ASET), 292 Yoshida-cho, Totsuka-ku, Yokohama, Kanagawa 244-0817, Japan

D6

Mass spectrometric detection of reactive neutral species: Beam-to-background ratio
Harmeet Singh, John W Coburn & David B Graves
Department of Chemical Engineering, University of California, Berkeley, California 94720, USA

D7

Mechanism of C 4 F 8 dissociation in parallel-plate-type plasmas
Hisataka Hayashi, Satoshi Morishita, Tetsuya Tatsumi, Yukinobu Hikosaka, Shuichi Noda, Hideo Nakagawa, Shoji Kobayashi & Masami Inoue
Tyuji Hoshino Texas Instruments, Tsukuba Research & Development Center Ltd., Tsukuba 305, Japan

D8

Study of polymeric neutral species in high-density fluorocarbon plasmas
Kungen Teii, Masura Hori, Masafumi Ito & Toshio Goto
Department of Quantum Engineering, Graduate School & Faculty of Engineering, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603, Japan

D9

Analysis of Product Species in Capacitively Coupled C 5 F 8 Plasma by Electron Attachment Mass Spectrometry
Shinichi Imai & Kunihide Tachibana*
ULSI Process Technology Development Center, Matsushita Electronics Corporation, 19 Nishikujo Kasugacho, Minami-ku, Kyoto 601-8413, Japan
*Dept of Electronic Science & Engineering, Kyoto University, Yoshida-honmachi, Sakyo-ku, Kyoto 606-8501, Japan

D10

Precursors of fluorocarbon film growth studied by mass spectrometry
Kungen Teii, Masura Hori, Toshio Goto & Nobo Ishii*
Department of Quantum Engineering, Graduate School & Faculty of Engineering, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603, Japan
*Central Research Laboratory, Tokyo Electron Ltd., 4-1-14 Miyahara, Yodogawa-ku, Osaka 532-0003, Japan

D11

Run-to-Run Evolution of Fluorocarbon Radicals in C 4 F 8 Plasmas Interacting with Cold and Hot Inner Walls
Hidetaka Oshio(a), Takanori Ichiki(a) & Yasuhiro Horiike(b)
a)Department of Electric & Electronics Engineering, Toyo University, Kawagoe 350-8585, Japan
b)School of Engineering, The University of Tokyo, Tokyo 113-8656, Japan

D12

Radical Density Measurement at Low-Pressure Discharge Denitrification by Appearance Mass Spectrometry
Kohei Ito, Katsuyuki Hagiwara, Hiroyuki Nakaura, Hidekazu Tanaka & Kazuo Onda
Toyohashi University of Technology, Toyohashi 441-8580, Japan