LANGMUIR PROBE APPLICATIONS

ESP1

A self-compensating Langmuir probe for use in RF (13.56 MHz) plasma systems
P.A. Chatterton, J.A. Rees, W.L. Wu, K. Al-Assadi.
Department of Electrical Engineering and Electronics, The University of Liverpool, Brownlow Hill, PO Box 147, Liverpool L69 3BX, UK
Vacuum , Volume 42 , Number 7, Pages 489 to 493, 1991

ESP2

LLNL large area inductively coupled plasma (ICP) source: Experiments
R. A. Richardson, P. O. Egan & R. D. Benjamin
Lawrence Livermore National Laboratory, Livermore, CA. 94550, USA

ESP3

Plasma cleaning of steel & aluminium studied by optical emission spectroscopy & Langmuir probe measurements
C. Barholm-Hanson & H. C. Pedersen
NKT Research Centre A/S, Sognevej 11, DK-2605 Br?ndby, Denmark

ESP4

Report of independent technical evaluation of Hiden equipment at 2 European sites (ESP with 600mm manual linear drive and Windows‘ software)
Dr. David L. Seymour
Hiden Analytical Ltd

ESP5

PIII assisted thin film deposition
S Shoser, J Forget, and K Kohohof
Robert Bosch GmbH, Corporate Research and Development, Dept, FV/FLD, POB 10 60 50, D-70049 Stuttgart, Germany

ESP6

The substrate-process interface in thin barrier film coating
C Bichler, M Bischoff, H C Langowski & U Moosheimer
Fraunhofer-Institute for Food Technology & Packing, Germany
1996 Society of Vacuum Coaters 505/856 - 7188, 378 - 383

ESP7

High-aspect-ration contact hole etching technology using inductively coupled plasma
Shinichi Imai, Nobuhiro Jiwari, and Hideo Nikoh
Kyoto Research Laboratory, Matsushita Electronics Corp, 19 Nishikuijo-Kasugacho, Minami-ku, Kyoto 601
1996 Dry Process Symposium

ESP8

Properties of titanium nitride film deposited by ionised metal plasma source
Yoichiro Tanaka, Edwin Kim, John Forster, and Zheng Xu
Applied Materials inc., PVD Technology, Santa Clara , California 95054, USA

ESP9

Ion energy distribution functions and Langmuir probe measurements in low argon discharge
V. Kaeppelin, M. Carrère, and J-M. Layet
Laboratoire de Physique des Interactions Ioniques et Moléculaires (PIIM), UMR 6633 CNRS, Université de Provence, Domaine Universitaire de Saint-Jérome, Case 241, Avenue Escadrille Normandie Niemen, F-13397 Cedex 20, France

ESP10

Langmuir probe analysis for high density plasmas
Francis F. Chen
Electrical engineering Department, University of California, Los Angeles, CA 90095-1594 USA

ESP11

The Floating Potential of Cylindrical Langmuir Probes
Francis F. Chen, and Donald Arnush
Electrical engineering Department, University of California, Los Angeles, CA 90095-1594 USA

ESP12

Spectroscopic study of plasma using zirconium tetra- t -butoxide for the plasma enhanced deposition of zirconium oxide
Byeong-Ok Cho, Sandy Lao, Lin Sha, and ane P. Chang
Department of Chemical Engineering, University of California, Los Angeles, California 90095 USA