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（1）Time-resolved ion flux measurements in pulsed, electron-beam- generated plasmas
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(Hiden EQP300)
Physical Review E, Volume 65,046412,2002 |
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（2）Analysis of relevant plasma parameters for ZnO：Al film deposition based on data from reactive and ono-reactive DC magnetron sputtering
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(Hiden EQP300)
Surface & Coatings Technology, 174-175(2003), 229-234 |
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（3）Plasma etching selectivity of ZrO2 to Si in BCl3/Cl2 plasmas
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(Hiden EQP1000)
J. Vac. Sci. Technol. A 21(6), Nov/Dec 2003 |
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（4）Plasma composition during plasma-enhanced chemical vapor deposition of carbon nanotubes
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(Hiden EQP)
Applied Physics Letters Volume 85, Number 7 16 August 2004 |
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（5）Absolute densities of N and excited N2 in a N2 plasma
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(Hiden PSM 002)
APPLIED PHYSICS LETTERS, VOLUME 83, NUMBER 24, 15 DECEMBER 2003 |
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（6）Studies of Ion Kinetic-Energy Distributions in the Gaseous Electronics Conference RF Reference Cell
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J. Res. Natl. Inst. Stand. Technol. 100, 383 (1995) |
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